Plasma-Etched Silicon Wafer

Download original media

Media Details

Created 04/19/2001

This is a plasma-etched silicon wafer, produced from an image of natural sand. The silicon wafer was etched to a depth of 50 micrometers. The image was acquired on the ESEM in the Microscopy Suite.

Credits

• Cheema Chomsurin , Department of Civil and Environmental Engineering

Back to all images